The museum is open Fridays through Tuesdays 11 a.m. to 4 p.m. Free timed-entry passes are required. Review our latest visitor safety guidelines.

Intel Tri-Gate Chip Mask

Intel Tri-Gate Chip Mask

<< >>
Usage conditions apply
Downloads
Description
This chip mask was used in the manufacture Intel’s 22 nanometer tri-gate transistor microprocessors. The silicon wafer is chemically treated to make it sensitive to ultraviolet light. A focused beam of extreme ultraviolet light shines through the chip mask, creating a microscopic pattern on the silicon. The patterns are then ionized to create positive and negative semiconductors. The process is repeated with a variety of masks to create all the necessary circuits and turn the semiconductors into transistors that make up an integrated circuit. The silicon wafer is then cut into chips, packaged, and sold to consumers.
Location
Currently not on view
Object Name
mask
Physical Description
glass (mask material)
Measurements
mask: 6 in x 6 in x 1/4 in; 15.24 cm x 15.24 cm x.635 cm
box: 9 7/8 in x 8 7/8 in x 1 7/8 in; 25.0825 cm x 22.5425 cm x 4.7625 cm
ID Number
2014.0098.02
catalog number
2014.0098.02
accession number
2014.0098
Credit Line
Gift of Intel Corporation
See more items in
Work and Industry: Production and Manufacturing
Industry & Manufacturing
Computers & Business Machines
American Enterprise
Data Source
National Museum of American History
Nominate this object for photography.   

Our collection database is a work in progress. We may update this record based on further research and review. Learn more about our approach to sharing our collection online.

If you would like to know how you can use content on this page, see the Smithsonian's Terms of Use. If you need to request an image for publication or other use, please visit Rights and Reproductions.

Comments

Add a comment about this object