Intel Tri-Gate Chip Mask

Intel Tri-Gate Chip Mask

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Usage conditions apply
This chip mask was used in the manufacture Intel’s 22 nanometer tri-gate transistor microprocessors. The silicon wafer is chemically treated to make it sensitive to ultraviolet light. A focused beam of extreme ultraviolet light shines through the chip mask, creating a microscopic pattern on the silicon. The patterns are then ionized to create positive and negative semiconductors. The process is repeated with a variety of masks to create all the necessary circuits and turn the semiconductors into transistors that make up an integrated circuit. The silicon wafer is then cut into chips, packaged, and sold to consumers.
Currently not on view
Object Name
Physical Description
glass (mask material)
mask: 6 in x 6 in x 1/4 in; 15.24 cm x 15.24 cm x.635 cm
box: 9 7/8 in x 8 7/8 in x 1 7/8 in; 25.0825 cm x 22.5425 cm x 4.7625 cm
ID Number
catalog number
accession number
Credit Line
Gift of Intel Corporation
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Work and Industry: Production and Manufacturing
Industry & Manufacturing
Computers & Business Machines
American Enterprise
Data Source
National Museum of American History
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